Recent Researches of Plasma-based Ion Implantation and Deposition in Japan
Author:
Affiliation:
1. Doshisha University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/ieejfms/123/8/123_8_715/_pdf
Reference23 articles.
1. (1) K. Yukimura and S. Masamune : “Shunting arc plasma generation and ion extraction”, Surf. Coat. Technol., Vol. 156, pp. 31-37 (2002)
2. (2) K. Yukimura, N. Tenno, and S. Masamune : “Carbon shunting arc inRF nitrogen plasmas-a basic study on plasma-based ion implantation”, Vacum, Vol. 65, pp. 341-346 (2002)
3. (3) Y. Nishimura, A. Chayahara, Y. Horino, and M. Yatsuzuka : “A new PBIID processing system supplying RF and HV pulses through a single feed-through”, Surf. Coat. Technol., Vol. 156, pp. 50-53 (2002)
4. (4) S. Miyagawa, S. Nakao, M. Ikeyama, and Y. Miyagawa : “Deposition of diamond-like carbon films using plasma based ion implantation with bipolar pulses”, Surf. Coat. Technol., Vol. 156, pp. 322-327 (2002)
5. (5) T. Watanabe, K. Yamamoto, O. Tsuda, A. Tanaka, and Y. Koga : “Synthesis of amorphous carbon films by plasma-based ion implantation using ECR plasma with a mirror field”, Surf. Coat. Technol., Vol. 156, pp. 317-321 (2002)
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