Entrapment of helium ions at (100) and (110) tungsten surfaces

Author:

Kornelsen E. V.

Abstract

Two (100) and two (110) tungsten surfaces have been bombarded with helium ions of selected energies between 5 and 2000 eV. The helium thermal desorption spectra obtained when the targets were subsequently heated at 40 °K/s were used to deduce the fraction of the incident particles trapped in the crystal, and their binding energies. For ion energies ≤400 eV, the fractions trapped were small (~ 1 × 10−3 on the (100) surfaces and ~ 1 × 10−2 on the (110) surfaces) and almost all the trapping occurred in surface-related sites with binding energies ≤ 2.1 eV. For ion energies >500 eV, trapping occurred predominantly in sites characteristic of the bulk material, the sites being created by the incoming ions as soon as their energy was sufficient to produce atomic displacements in the lattice (480 eV). At doses <1 × 1013 ions/cm2, four characteristic binding energies were observed: 2.65, 3.05, 3.35, and 4.15 eV. At higher doses, additional binding states were observed with energies up to 5.4 eV.The results suggest that helium diffuses rapidly in tungsten at room temperature and that it is trapped within the crystals only if it encounters lattice defects. Estimates of the ion penetration depth lead to the tentative conclusion that in the annealed crystals (ion energies < 400 eV) the fractional trap concentration is <1 × 10−9 and the helium incident at a few hundred eV energy becomes trapped at depths up to at least 1 μ.

Publisher

Canadian Science Publishing

Subject

General Physics and Astronomy

Cited by 95 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3