Effect of the Low-Pressure Chemical Vapor Deposition Time on the Silicon Morphology
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Published:2009-02-14
Issue:2
Volume:54
Page:703-706
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ISSN:0374-4884
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Container-title:Journal of the Korean Physical Society
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language:en
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Short-container-title:J. Korean Phy. Soc.
Author:
Choi Kwang Nam,Chung Kwan Soo
Publisher
Korean Physical Society
Subject
General Physics and Astronomy