Etching for Vertical Sidewall Formation in TiO<sub>2</sub> Nanorods-Reference-Cited by-同舟云学术

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Etching for Vertical Sidewall Formation in TiO₂ Nanorods

Published:2022-09-30 Issue:5 Volume:31 Page:113-115
ISSN:2288-6559
Container-title:Applied Science and Convergence Technology
language:en
Short-container-title:Appl. Sci. Converg. Technol.

Author:

Park Minsu¹²^ORCID,Yoon Ilsun³^ORCID,Park Yeonsang¹²^ORCID

Affiliation:

1. Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea

2. Institute of Quantum Systems, Chungnam National University, Daejeon 34134, Republic of Korea

3. Department of Chemistry, Chungnam National University, Daejeon 34134, Republic of Korea

Publisher

The Korean Vacuum Society

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,Materials Science (miscellaneous),General Medicine

Link

http://pdf.medrang.co.kr/ASCT/2022/031/ASCT031-05-04.pdf

Reference15 articles.

1. Dry etch chemistries for TiO2 thin films

2. Response to a letter about "Chips, Chatter and Friends"

3. Broadband high-efficiency dielectric metasurfaces for the visible spectrum

4. Response to a letter about "Chips, Chatter and Friends"

5. Response to a letter about "Chips, Chatter and Friends"

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