Computation lithography: virtual reality and virtual virtuality
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference13 articles.
1. Characterization of positive photoresist
2. In-situ measurement of dielectric thickness during etching or developing processes
3. Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory
4. Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate
5. Numerical solution of initial boundary value problems involving maxwell's equations in isotropic media
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