157-nm coherent light source as an inspection tool for F_2 laser lithography
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference15 articles.
1. Precision measurement of wavelengths emitted by a molecular fluorine laser at 157 nm
2. Challenge of the F 2 laser for dioptric projection system
3. Advanced F 2 lasers for microlithography
4. Feasibility of highly line-narrowed F 2 laser for 157-nm microlithography
5. Tunable VUV radiation generated by two-photon resonant frequency mixing in xenon
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