Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source-Reference-Cited by-同舟云学术

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Published:2018-08-13 Issue:17 Volume:26 Page:22218
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Vetter Andreas^ORCID,Kirner Raoul,Opalevs Dmitrijs,Scholz Matthias,Leisching Patrick,Scharf Toralf^ORCID,Noell Wilfried,Rockstuhl Carsten,Voelkel Reinhard

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference28 articles.

1. High-resolution proximity lithography for nano-optical components

2. Contact and proximity lithography using 193nm Excimer laser in Mask Aligner

3. Mask aligner lithography using laser illumination for versatile pattern generation

4. High-power modular LED-based illumination systems for mask-aligner lithography

5. Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm

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