Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography
Author:
Publisher
The Optical Society
Reference12 articles.
1. Tenth micron lithography with a 10 Hz 37.2 nm sodium laser
2. Soft x-ray projection lithography using an x-ray reduction camera
3. Extreme ultraviolet free-electron laser-based projection lithography systems
4. X-ray sources for microlithography created by laser radiation at λ=0.26 μm
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