Extended x-ray absorption fine structure measurements on radio frequency magnetron sputtered HfO_2 thin films deposited with different oxygen partial pressures-Reference-Cited by-同舟云学术

Extended x-ray absorption fine structure measurements on radio frequency magnetron sputtered HfO_2 thin films deposited with different oxygen partial pressures

Published:2016-03-15 Issue:9 Volume:55 Page:2175
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Maidul Haque S.,Nayak C.,Bhattacharyya Dibyendu,Jha S. N.,Sahoo N. K.

Publisher

The Optical Society

Reference18 articles.

1. High-κ gate dielectrics: Current status and materials properties considerations

2. Determination of the optical constants of HfO2–SiO2 composite thin films through reverse fitting of transmission spectra

3. Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films

4. Commissioning and first results of scanning type EXAFS beamline (BL-09) at INDUS-2 synchrotron source

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