Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method
Author:
Funder
National Science and Technology Major Project
Publisher
The Optical Society
Reference12 articles.
1. Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)
2. Designing extreme-ultraviolet lithographic objective for 11 nm node
3. EUV lithography optics for sub-9nm resolution
4. Imaging performance of EUV lithography optics configuration for sub-9nm resolution
5. EUV lithography scanner for sub-8nm resolution
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1. Polarization aberration in catadioptric anamorphic optical system;Optical Design and Testing XIII;2023-11-28
2. Design of tilted and decentered anamorphic optical system based on nodal aberration control;Optik;2023-10
3. 极紫外光刻机曝光系统光学设计研究与进展;Acta Optica Sinica;2023
4. Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory;Applied Optics;2022-10-03
5. Grouping design method dependence on an illumination system and large off-axis distance for an anamorphic extreme ultraviolet lithography objective;Applied Optics;2022-01-18
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