Tensile-strained germanium-on-insulator substrate fabrication for silicon-compatible optoelectronics-Reference-Cited by-同舟云学术

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Tensile-strained germanium-on-insulator substrate fabrication for silicon-compatible optoelectronics

Published:2011-09-16 Issue:6 Volume:1 Page:1121
ISSN:2159-3930
Container-title:Optical Materials Express
language:en
Short-container-title:Opt. Mater. Express

Author:

Jain J. Raja,Ly-Gagnon Dany-Sebastien,Balram Krishna C.,White Justin S.,Brongersma Mark L.,Miller David A. B.,Howe Roger T.

Publisher

The Optical Society

Subject

Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Resonant Cavity Enhanced Ge Photodetectors for 1550 nm Operation on Reflecting Si Substrates

2. Ultra-low capacitance and high speed germanium photodetectors on silicon

3. Reinventing germanium avalanche photodetector for nanophotonic on-chip optical interconnects

4. Band structure, deformation potentials, and carrier mobility in strained Si, Ge, and SiGe alloys

5. Toward a Germanium Laser for Integrated Silicon Photonics

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1. Mechanically induced optical loss mechanism due to thermal expansion coefficient mismatch in micro-cavities with all-around stressor layers;APL Photonics;2024-05-01

2. Interaction of Electromagnetic Radiation with a Semiconductor Nanolayer in the Case of an Arbitrary Rotation Axis Orientation of an Constant Energy Ellipsoid;Russian Microelectronics;2023-12

3. Defect‐Engineered Electrically‐Injected Germanium‐on‐Insulator Waveguide Light Emitters at Telecom Wavelengths;Advanced Electronic Materials;2023-08-10

4. Simultaneous Crystallization and Strain Induction Enable Light-Emitting Germanium Nano/Microbridges for Infrared Lasers;ACS Applied Nano Materials;2022-04-05

5. Effect of Substrate Biasing on the Epitaxial Growth and Structural Properties of RF Magnetron Sputtered Germanium Buffer Layer on Silicon;Coatings;2021-09-02

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