Surface metrology by multiple-wavelength coherent modulation imaging

Abstract

With the rapid progress of advanced manufacturing, three-dimensional metrology techniques that are able to achieve nanometer spatial resolution and to capture fast dynamics are highly desired, for which a snapshot ability and a common-light-path setup are required. Commonly used off-axis holography and phase-shifting interferometry are short in fulfilling those requirements. We studied the suitability and performance of the coherent modulation imaging (CMI) method for metrology applications. Both transparent and reflective samples are measured in visible light experiments. Thanks to its ability to retrieve separate wavefronts at different wavelengths from a single measurement, CMI allows for attaining an enlarged range of measurement free from phase wrapping by utilizing the concept of synthetic wavelength. The CMI method fulfills well the requirements for advanced metrology and can be implemented at any wavelength. We expect it would be a powerful addition to the pool of advanced metrology tools.