Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
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1. Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask;Journal of Synchrotron Radiation;2019-08-16
2. Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography;SPIE Proceedings;2016-10-31
3. Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes;Scientific Reports;2016-07-28
4. Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings;Chinese Optics Letters;2016
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