High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams

Author:

Du Mengqi1ORCID,Liu Xiaomeng12,Pelekanidis Antonios12,Zhang Fengling12,Loetgering Lars3ORCID,Konold Patrick4,Porter Christina L.5,Smorenburg Peter5,Eikema Kjeld S. E.12,Witte Stefan12ORCID

Affiliation:

1. ARCNL

2. Vrije Universiteit Amsterdam

3. Helmholtz Institut Jena

4. Uppsala University

5. ASML Netherlands B.V.

Abstract

Coherent multi-spectral extreme ultraviolet beams have great potential for providing high spatial and temporal resolution for microscopy and spectroscopy applications. But due to the limitations of short-wavelength optics and the broad bandwidth, it remains a challenge to perform quantitative, high-resolution beam characterization. Here we present a wavefront sensing solution based on multiplexed ptychography, with which we show spectrally resolved, high-resolution beam reconstructions. Furthermore, using these high-fidelity quantitative wavefront measurements, we investigate aberration transfer mechanisms in the high-harmonic-generation process, where we present and explain harmonic-order-dependent astigmatism inheritance from the fundamental wavefront. This ptychographic wavefront sensing concept thus enables detailed studies of the high-harmonic-generation process, such as spatiotemporal effects in attosecond pulse formation.

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

European Research Council

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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