Perpendicular-incidence photometric ellipsometry of biaxial anisotropic thin films

Abstract

Since the last decade, the application of optical coatings for the ultraviolett (UV) range has increased enormously. Especially mirrors (HR) and antireflecting (AR) coatings with minimal optical losses and long time stability are the optical components of interest. For the depostion of high quality interfence coatings, extensive knowledge of the optical properties and microstructure of the materials is necessary. One frequently used high refractive material down to the UV range is HfO2. Moreover, this material is important for XeCl- and KrF-excimer-laser coatings at 308 nm and 248 nm, respectively /1/.