Precision absolute thin film standard reference targets for Rutherford backscattering microanalysis

Author:

Rigo S.,Cohen C.,L'hoir A.,Backelandt E.

Publisher

Elsevier BV

Subject

General Medicine

Reference15 articles.

Cited by 37 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. The Si surface yield as a calibration standard for RBS;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-03

2. Highly stable sputtered NiInW refractory ohmic contact ton‐type GaAs;Journal of Applied Physics;1992-10-15

3. Nuclear reaction analyses of boron nitride films deposited by ion beam based techniques;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-02

4. Characterization of high-dose implants of Co and Cr in Si by RBS;Vacuum;1991-01

5. Characterization and growth mechanisms of boron nitride films synthesized by ion‐beam‐assisted deposition;Journal of Applied Physics;1990-09-15

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