Aspects of the physics, chemistry, and technology of high intensity heavy ion sources
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference92 articles.
1. Tabellem der Elektronenphysik, Ionenphysik und Übermikroskopie;Von Ardenne,1956
2. Physics and techniques of plasma ion sources;Gabovich,1972
3. Proc.;Freeman,1972
4. The technology and chemistry of heavy ion sources
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