Characteristics of ion-implanted contacts for nuclear particle detectors
Author:
Publisher
Elsevier BV
Subject
General Medicine
Reference7 articles.
1. RANGE OF Xe133 AND Ar41 IONS OF KILOELECTRON VOLT ENERGIES IN ALUMINUM
2. Implantation profiles of 32P channeled into silicon crystals
3. ION IMPLANTATION OF SILICON: II. ELECTRICAL EVALUATION USING HALL-EFFECT MEASUREMENTS
4. DEEP (1–10 μ) PENETRATION OF ION‐IMPLANTED DONORS IN SILICON
5. ANOMALOUS PENETRATION OF XENON IN TUNGSTEN CRYSTALS—A DIFFUSION EFFECT
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1. Catalytic preparation of diacetone alcohol in controlled flow conditions;Reaction Kinetics & Catalysis Letters;1991-09
2. Contribution to the study of the aldol condensation process;Reaction Kinetics and Catalysis Letters;1989-09
3. The response of silicon position sensitive detectors to heavy ions;Nuclear Instruments and Methods in Physics Research;1983-01
4. Dead Layers in Charged-Particle Detectors;IEEE Transactions on Nuclear Science;1973-02
5. Electrical properties of silicon implanted with boron ions of MeV energy;Radiation Effects;1973-01
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