Process induced poling and plasma induced damage of thin film PZT-Reference-Cited by-同舟云学术

Process induced poling and plasma induced damage of thin film PZT

Published:2017-06 Issue: Volume:177 Page:13-18
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Wang Jiahui,Houwman Evert,Salm Cora,Nguyen Minh,Vergeer Kurt,Schmitz Jurriaan

Funder

ENIAC Joint Undertaking

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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