Portable UV nanoimprint lithography system using hydraulic pressure
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Published:2021-07
Issue:
Volume:247
Page:111587
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ISSN:0167-9317
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Container-title:Microelectronic Engineering
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language:en
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Short-container-title:Microelectronic Engineering
Author:
Kang Hojung,Choi Eunseo,Park Jaemin,Sung Young Hoon,Kim Kwan,Ju Sucheol,Lee Heon
Funder
Ministry of Trade, Industry and Energy
Ministry of Science, ICT and Future Planning
National Research Foundation of Korea
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Fabrication of TiO2 nano-to-microscale structures using UV nanoimprint lithography;Choi;Nanotechnology,2013
2. Enhancement in performance of optoelectronic devices by optical-functional patterns;Kim;Appl. Phys. A Mater. Sci. Process.,2015
3. Numerical Analysis of Impact of Imprinting Pressure on Profile Shape and Mold Deformation in UV-NIL;Du,2011
4. Novel thermoplastic polymers with improved release properties for thermal NIL;Atasoy,2011
5. UV curing nanoimprint lithography for uniform layers and minimized residual layers;Lee;Japanese J. Appl. Phys.,2004