Unbiased roughness measurements: Subtracting out SEM effects-Reference-Cited by-同舟云学术

Unbiased roughness measurements: Subtracting out SEM effects

Published:2018-04 Issue: Volume:190 Page:33-37
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lorusso Gian F.,Rutigliani Vito,Van Roey Frieda,Mack Chris A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Determination of optimal parameters for CD-SEM measurement of line edge roughness;Bunday,2004

2. Unbiased estimation of linewidth roughness;Villarrubia,2005

3. Bias reduction in roughness measurement through SEM noise removal;Katz,2006

4. Bias-free measurement of LER/LWR with low damage of CD-SEM;Yamaguchi,2006

5. Practical and bias-free LWR measurement by CDSEM;Wang,2008

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