Author:
Hauguth M.,Volland B.E.,Ishchuk V.,Dressler D.,Danz T.,Rangelow I.W.,Kokkoris G.,Gogolides E.,Goodyear A.,Cooke M.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. G. Kokkoris, A. Panagiotopoulos, A. Goodyear, M.J. Cooke, E. Gogolides, J. Phys. D.: Appl. Phys. (submitted for publication).
2. A global model for C4F8plasmas coupling gas phase and wall surface reaction kinetics
3. M. Hauguth, T. Danz, B.E. Volland, I.W. Rangelow, in: Proceedings of the MNE 2007 Conference, vol. 85, 2008, pp. 982–984. doi:10.1016/j.mee.2008.01.019.
4. Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution
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