SiO2 aerogel ultra low k dielectric patterning using different hard mask concepts and stripping processes-Reference-Cited by-同舟云学术

SiO2 aerogel ultra low k dielectric patterning using different hard mask concepts and stripping processes

Published:2004-10 Issue:1-4 Volume:76 Page:8-15
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Blaschta F.,Schulze K.,Schulz S.E.,Gessner T.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

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