Methyl ammonium iodide via novel PECVD process for the growth of 2-step vacuum based perovskite (MAPbI3) thin films
Author:
Funder
National Physical Laboratory
Council of Scientific and Industrial Research, India
University Grants Commission
Publisher
Elsevier BV
Subject
Materials Chemistry,Mechanics of Materials,General Materials Science
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Tin Lodide Thin Films Growth via Plasma Enhanced Chemical Vapor Deposition and its Optimization Using V–I Probe Impedance Analyser for Optoelectronic Applications;ChemistrySelect;2024-08-28
2. Lead-free methyl ammonium tin iodide perovskite thin film growth in single step via plasma enhanced chemical vapour deposition technique and its optoelectronic properties;Thin Solid Films;2024-08
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