Author:
Pinzelli L.,Gros-Jean M.,Bréchet Y.,Volpi F.,Bajolet A.,Giraudin J.-C.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Monfray S, Skotnicki T, Morand Y, Descombes S, Coronel P, Mazoyer P, et al. VLSI technology. Digest of technical papers; 2002. p. 108–9.
2. Bajolet A, Giraudin J-C, Rossato C, Pinzelli L, Bruyere S, Cremer S, et al. In: Proceeding of the IEEE ESSDERC conference; 2005. p. 121–4.
3. CVD of Tantalum Oxide Dielectric Thin Films for Nanoscale Device Applications
4. Low temperature metal-organic chemical vapor deposition of advanced barrier layers for the microelectronics industry
5. Deloffre E. Thèse INPG, Fabrication et caractérisation physico-chimique et électrique d’empilement TiN/Ta2O5/TiN. Application aux capacités MIM pour les circuits intégrés analogiques et radiofréquences; 2005.
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2 articles.
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