Investigation of optical and chemical bond properties of hydrogenated amorphous silicon nitride for optoelectronics applications

Author:

Herth E.,Desré H.,Algré E.,Legrand C.,Lasri T.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Fabrication and optical characterization of thin two-dimensional Si3N4 waveguides;Daldosso;Mater Sci Semicond Process,2004

2. Low stress PECVD-SiNx layers at high deposition rates using high power and high frequency for MEMS applications;Iliescu;J Micromech Microeng,2006

3. Low propagation loss SiN optical waveguide prepared by optimal low-hydrogen module;Mao;J Opt Exp,2008

4. Comparative investigation of hydrogen bonding in silicon based PECVD grown dielectrics of optical waveguides;Ay;J Opt Mater,2004

5. Fabrication of silicon nitride waveguides for visible-light using PEVCD: a study of the effect of plasma frequency on optical properties;Gorin;J Opt Exp,2008

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