A comparative chemical network study of HWCVD deposited amorphous silicon and carbon based alloys thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference27 articles.
1. IR-study of a-SiCx:H and a-SiCxNy:H films for c-Si surface passivation
2. Time resolved photoluminescence of hydrogenated amorphous silicon carbon thin films deposited by HWCVD
3. Multiphase structure of hydrogen diluted a-SiC:H deposited by HWCVD
4. Effect of H2 dilution on Cat-CVD a-SiC:H films
5. Microscopic properties of H2 diluted HWCVD deposited a-SiC:H film
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