Deposition of alumina from dimethylaluminum isopropoxide
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Ceramics and Composites
Reference20 articles.
1. The Preparation of Thin Alumina Films by Metal-Organic Chemical Vapour Deposition: A Short Review
2. Molecular design of improved precursors for the MOCVD of oxides used in microelectronics
3. Metal alkoxides;Bradley,1978
4. Chemical vapor deposition of Al2O3 films using highly volatile single sources
5. Al2O3 thin films from aluminium dimethylisopropoxide by metal–organic chemical vapour deposition
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1. Increasing the sensitivity of chemically resistant lossy mode resonance-based sensors on Al2O3 coatings;Optical Materials;2024-03
2. Metalorganic chemical vapor deposition of aluminum oxides: A paradigm on the process-structure-properties relationship;Metal Oxides for Non-volatile Memory;2022
3. Al 2 O 3 thin films prepared by plasma-enhanced chemical vapor deposition of dimethylaluminum isopropoxide;Thin Solid Films;2017-11
4. A Process-Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI);Chemical Vapor Deposition;2015-11-10
5. Alumina thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide: a process-structure investigation;physica status solidi (c);2015-06-05
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