Sputtering of CoSi(100) and CoSi2(100) single crystal surfaces
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference18 articles.
1. Preparation of atomically clean surfaces of selected elements: A review
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3. On the problem of whether mass or chemical bonding is more important to bombardment-induced compositional changes in alloys and oxides
4. Sputtering of chemisorbed gas (nitrogen on tungsten) by low‐energy ions
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1. Atomically flat surface preparation for surface-sensitive technologies*;Chinese Physics B;2020-01-01
2. CoSi2 on Si(100): LEED investigations of the c(2 × 2) and (2√2 × √2) phases and comparison to a bulk crystal CoSi2(100) surface;Surface Science;1996-05
3. LEED structure determination of the (100)-surface of a CoSi2 crystal and a CoSi2 film grown epitaxially on Si(100);Surface Science;1996-02
4. Preferential sputtering of argon ion bombarded Ni3Al and TaSi2;Applied Surface Science;1995-10
5. Preferential sputtering in binary targets;Progress in Surface Science;1995-06
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