Pulsed laser atom-probe study of clean and oxygen-covered silicon-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Pulsed laser atom-probe study of clean and oxygen-covered silicon

Published:1982-07 Issue: Volume:11-12 Page:186-195
ISSN:0378-5963
Container-title:Applications of Surface Science
language:en
Short-container-title:Applications of Surface Science

Author:

Kellogg G.L.

Publisher

Elsevier BV

Subject

General Engineering

Reference37 articles.

1. The adsorption of oxygen on clean silicon surfaces

2. Kinetics and mechanism of oxygen adsorption on single crystals of germanium

3. Calorimetric study of the adsorption of oxygen and gases HxA on germanium and silicon

4. Oxidation of Clean Ge and Si Surfaces

5. Core-Electron Excitation Spectra of Si, SiO, and SiO2

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Pulsed-Laser Atom Probe: A Review of Its Development and Initial Applications;Microscopy and Microanalysis;2017-07

2. Applicability of post-ionization theory to laser-assisted field evaporation of magnetite;Applied Physics Letters;2014-12-15

3. Some aspects of the silicon behaviour under femtosecond pulsed laser field evaporation;Ultramicroscopy;2007-09

4. Atom-probe field ion microscope analysis of surfaces of materials;Journal of Materials Research;1989-12

5. KINETIC ENERGY AND MASS ANALYSIS OF COVALENT GROUP IV CLUSTER IONS IN PULSED-LASER STIMULATED FIELD EVAPORATION;Le Journal de Physique Colloques;1988-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3