Author:
Kim Sang-Yong,Lee Kyoung-Jin,Seo Yong-Jin
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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4. An optimized nitride residue phenomena of shallow trench isolation (STI) process by chemical mechanical polishing (CMP);Kim,1998
5. Study of micro-defect on oxide CMP in VLSI circuits;Kim;Electrochem. Soc. Proc.,1999
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