Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films-Reference-Cited by-同舟云学术

Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films

Published:2002-07 Issue: Volume:61-62 Page:295-300
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Bruenger W.H.,Dzionk C.,Berger R.,Grimm H.,Dietzel A.,Letzkus F.,Springer R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

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2. Ion beam patterning of magnetic films using stencil masks;Terris;Appl. Phys. Lett.,1999

3. Ion projection lithography for resistless patterning of thin magnetic films;Bruenger;Microelectronic Engineering,2000

4. Ion induced magnetization reorientation in Co/Pt multilayers for patterned media;Weller;J. Appl. Phys.,2000

5. T. Devolder et al., Nuclear Instruments and Methods in Physics Research B175-177 (2000) 375–381.

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