Silicides for the 100-nm node and beyond: Co-silicide, Co(Ni)-silicide and Ni-silicide-Reference-Cited by-同舟云学术

Silicides for the 100-nm node and beyond: Co-silicide, Co(Ni)-silicide and Ni-silicide

Published:2002-10 Issue:1-4 Volume:64 Page:131-142
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lauwers A,de Potter M,Chamirian O,Lindsay R,Demeurisse C,Vrancken C,Maex K

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Nucleation of a new phase from the interaction of two adjacent phases: Some silicides

2. Influence of Ti on CoSi2 nucleation

3. Integration Challenges for Advanced Salicide Processes and their Impact on CMOS Device Performance

4. Study of CoSi2 formation from a Co–Ni alloy

5. Nucleation of a new phase from the interaction of two adjacent phases: Some silicides

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