Common Precursors and Surface Mechanisms for Atomic Layer Deposition-Reference-Cited by-同舟云学术

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Common Precursors and Surface Mechanisms for Atomic Layer Deposition

Published:2022 Issue: Volume: Page:534-552
ISSN:
Container-title:Comprehensive Organometallic Chemistry IV
language:
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Author:

Barry Seán Thomas,Gordon Peter George,Vandalon Vincent

Publisher

Elsevier

Reference155 articles.

1. Atomic Layer Deposition: An Overview;George;Chem. Rev.,2010

2. Organometallic Precursors for Atomic Layer Deposition;Putkonen,2005

3. Atomic Limits (2021) ALD Database, https://www.atomiclimits.com/alddatabase/. doi: 10.6100/alddatabase.

4. Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/Water Process;Puurunen;J. Appl. Phys.,2005

5. Molecular Layer Epitaxy;Kurabayashi;J. Electrochem. Soc.,1985

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1. Put a Ring on It: Improving the Thermal Stability of Molybdenum Imides through Ligand Rigidification;Organometallics;2024-06-13

2. Synthesis, Characterization, and Single-Crystal X-ray Structures of Refractory Metal Compounds as Precursors for the Single-Source Chemical Vapor Deposition of Metal Nitrides;Inorganic Chemistry;2023-12-08

3. Disturbance of intermolecular forces: eutectics as a new tool for the preparation of vapor-phase deposition precursors;Physical Chemistry Chemical Physics;2023

4. Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor;Journal of Vacuum Science & Technology A;2023-01

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