A comparative study of the interaction between microhole sidewall and the plasma generated by nanosecond and femtosecond laser ablation of deep microholes
Author:
Publisher
Elsevier BV
Subject
Industrial and Manufacturing Engineering,Management Science and Operations Research,Strategy and Management
Reference63 articles.
1. Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and systems: a review;Malek;Microelectronics Journal,2004
2. Massive replication of polymeric high-aspect-ratio microstructures using PDMS casting;Park;Proceedings of SPIE,2001
3. Laser drilling of cooling holes in aeroengines: state of the art and future challenges;McNally;Materials Science and Technology,2004
4. Deep drilling of metals by femtosecond laser pulses;Kamlage;Applied Physics A: Materials Science & Processing,2003
5. Laser drilling of high aspect ratio holes in copper with femtosecond, picosecond and nanosecond pulses;Weck;Applied Physics A: Materials Science & Processing,2008
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