1. Dielectric and polysilicon film deposition;Adams,1983
2. Influence of AsH3, PH3, and B2H6 on the growth rate and resistivity of polycrystalline silicon films deposited from a SiH4-H2 mixture;Eversteyn;J. Electrochem. Soc.,1973
3. Structure and properties of LPCVD silicon films;Kamins;J. Electrochem. Soc.,1980
4. Kamins T I 1986 Electrical properties of polycrystalline-silicon thin films for VLSI. In: Wittmer M, Stimmel J, Strothman M (eds.) 1986 Materials Issues in Integrated Circuit Processing, Materials Research Society Symposium Proceedings, Vol. 71. Materials Research Society, Pittsburgh, PA, pp. 261–72
5. Growth of polysilicon ingots by HEM for photovoltaic applications;Khattak,1987