Molecular organometallic resists for EUV (MORE)
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Elsevier
Reference90 articles.
1. Advanced dual hard mask patterning scheme to enable high resolution lithography for sub 30nm Technology nodes;Paul;ECS Meet Abstr,2012
2. Evaluation of an advanced dual hard mask stack for high resolution pattern transfer;Paul;Proc SPIE,2013
3. Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations;Patsis;Microelectron Eng,2004
4. Influence of molecular weight of resist polymers on surface roughness and line-edge roughness;Yamaguchi;J Vac Sci Technol B,2004
5. Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films;Yamaguchi;Appl Phys Lett,1997
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