EUV lithography process challenges
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Publisher
Elsevier
Reference111 articles.
1. Fifty years of Moore's law;Mack;IEEE Trans Semicond Manufac,2011
2. High resolution optical lithography or high throughput electron beam lithography: the technical struggle from the micro to the nano-fabrication evolution;Okazaki;Microelectron Eng,2015
3. Resolution limits of optical lithography;Okazaki;J Vac Sci Technol B,1991
4. Extreme ultraviolet interference lithography with incoherent light;Naulleau;Proc SPIE,2007
5. Evaluation of EUV resist performance using interference lithography;Buitrago;Proc SPIE,2015
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