Effect of high-k and vacuum dielectrics as gate stack on a junctionless cylindrical surrounding gate (JL-CSG) MOSFET

Author:

Sharma Aniruddh,Jain Arushi,Pratap Yogesh,Gupta R.S.

Funder

Defense Research Development Organization

University Grant Commission (UGC), Govt. of India

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference29 articles.

1. A guide to short-channel effects in MOSFETs;Duvvury;IEEE Circ Dev Mag,1986

2. Simulation of sub-0.1-μm MOSFET’s with completely suppressed short-channel effect;Tanaka;IEEE Electron Dev Lett,1993

3. Corner and short-channel effects in recessed channel dopant segregated Schottky barrier MOSFETs;Hsia,2012

4. Limit of gate oxide thickness scaling in MOSFETs due to apparent threshold voltage fluctuation induced by tunnel leakage current;Koh;IEEE Trans Electron Dev,2000

5. Nanowire transistors without junctions;Colinge;Nat Nano,2010

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