Buried-channel SiGe HMODFET device potential for micropower applications

Author:

Vilches A,Michelakis Kostis,Fobelets Kristel,Haigh David,Papavassiliou Christos,Hackbath T,Konig U

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. High fmax n-type Si/SiGe MODFETs;Gluck;Electron. Lett.,1997

2. Michelakis K, Despotopoulos S, Gaspari V, Vilches A, Fobelets K, Papavassiliou C. SiGe virtual substrate HMOS transistor for analogue applications. In: First International SiGe Technology and Device Meeting (ISTDM 2003), January 2003. Also accepted for publication in a future regular issue of Applied Surface Science

3. Fabrication and properties of n-channel SiGe/Si modulation doped field-effect transistors grown by MBE;Daembkes;IEDM Techn. Dig.,1985

4. Papavassiliou C, Fobelets K, Toumazou C. SiGe hetero-FET potential for micro-power applications. Invited paper, IEICE Trans Electron, E00-A(2000)

5. Optimised n-channelSi/SiGe HFETs design for VTH shift immunity;Jeamsaksiri;Solid State Electron.,2002

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