Endurance degradation and lifetime model of p-channel floating gate flash memory device with 2T structure

Author:

Wei Jiaxing,Liu Siyang,Liu Xiaoqiang,Sun Weifeng,Liu Yuwei,Liu Xiaohong,Hou Bo

Funder

Natural Science Foundation of Jiangsu Province

National Natural Science Foundation of China

Project of Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory

Qing Lan Project

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Simulation of the programming efficiency and the energy consumption of flash memories during endurance degradation;Postel-Pellerin,2016

2. Push the flash floating gate memories toward the future low energy application;Della Marca;Solid-State Electron,2013

3. Evidence of erratic behaviors in p-channel floating gate memories and a cell architectural solution;Chimenton,2009

4. Device characteristics of 0.35 m P-channel DINOR flash memory using band-to-band tunneling-induced hot electron (BBHE) programming;Ohnakado;IEEE Trans Electron Dev,1999

5. N-channel versus P-channel flash EEPROM-which one has better reliabilities;Chung;IEEE Int Reliab Phys Symp Proc,2001

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