Analytical model of LDMOS with a double step buried oxide layer

Author:

Yuan Song,Duan Baoxing,Cao Zhen,Guo Haijun,Yang Yintang

Funder

National Key Basic Research Program of China

State Key Program of National Natural Science of China

Science and Technology Innovation Project of Shaanxi Province

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. A novel high-breakdown-voltage SOI MESFET by modified charge distribution;Aminbeidokhti;IEEE Trans Electron Device,2012

2. A trench isolated thick SOI process as platform for various electrical and optical integrated devices;Lerner,2013

3. Device design of partial-SOI SJ-LDMOS with n type charge islands;Tang,2013

4. Radiation effects in advanced SOI devices: new insights into total ionizing dose and double-event effects;Gaillardin,2013

5. New concept for improving characteristics of high-voltage power devices by buried layers modulation effect;Duan,2006

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