Author:
Todi R.M.,Sundaram K.B.,Warren A.P.,Scammon K.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Structural properties of amorphous silicon carbide films by plasma‐enhanced chemical vapor deposition
2. Raman scattering studies of chemical‐vapor‐deposited cubic SiC films of (100) Si
3. Tsuo YS, Wu X, Alleman JL, Li X, Qu Y, Ciszek TF, et al. Conference Record of the Twenty Third IEEE Photovoltaic Specialists Conference-1993 (Cat, No. 93CH3283-9), Louisville, KY, USA, 10–14 May 1993 (New York, NY, USA: IEEE 1993) 281.
4. Effects of oxidation conditions on electrical properties of SiC‐SiO2interfaces
5. Chemical vapor deposition and characterization of 6H‐SiC thin films on off‐axis 6H‐SiC substrates
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