Author:
Kourouklis C.,Kohlmeier T.,Gatzen H.H.
Subject
Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. J. Steigewald, Chemical Mechanical Planarization of Microelectronic Materials, New York, 1997.
2. J.H. Smith, Planarization Techniques for MEMS: Enabling New Structures and Enhancing Manufacturability, in: Proceedings of the SPIE, 3321, December 1996, pp. 798–807.
3. J.J. Sniegowski, Chemical–Mechanical Polishing: Enhancing the Manufacturability of MEMS, in: Proceedings of the SPIE, Austin, TX, USA, 2879, 1996, pp. 104–115.
4. J.M. Neirynck, et al., Investigations of the Chemical–Mechanical Polishing of Polymer Films for ILD Applications, in: Proceedings of the Spring Meeting of MRS, USA, 1995, pp. 229–235.
5. H.H. Gatzen, et al., A Thin Film Technology Eddy Current Microsensor, Intermag Europe 2002 Digest of Technical Papers, 2002, p. GE03.
Cited by
26 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献