Author:
Drouiche N.,Ghaffour N.,Lounici H.,Mameri M.
Subject
Mechanical Engineering,Water Science and Technology,General Materials Science,General Chemical Engineering,General Chemistry
Reference26 articles.
1. Chemical Mechanical Polishing in Semiconductor Processing,2000
2. A preliminary study on electrically enhanced crossflow microfiltration of CMP (chemical mechanical polishing) wastewater;Yang;Water Sci. Technol.,2002
3. Chemical Mechanical Planarization of Semiconductor Materials;Steigerwald,1997
4. Treating wastewater from CMP using ultrafiltration;Browne;MICRO,1999
5. Treatment of alumina and silia chemical mechanical polishing waste by electrodecantation and electrocoagulation;Belongia;J. Electrochem. Soc.,1999
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