Impact of back gate work function for enhancement of analog/RF performance of AJDMDG Stack MOSFET

Author:

Basak Arighna,Sarkar AngsumanORCID

Publisher

Elsevier BV

Reference33 articles.

1. International technology roadmap for semiconductors 2009 Edition and 2010 Update. http://www.itrs.net. Accessed 2018.

2. Gate stack high-κ materials for Si-based MOSFETs past, present, and futures;Mohsenifar;Microelectronics and Solid State Electronics,2015

3. Recent advances in high performance CMOS transistors: from planar to non-planar;Datta;Electrochem Soc Interfac,2013

4. A Short-Channel-Effect-Degraded Noise Margin Model for Junctionless Double-Gate MOSFET Working on Subthreshold CMOS Logic Gates;Chiang;IEEE Transaction on Electron Devices,2016

5. Drain current modelling of unipolar junction dual material double-gate MOSFET (UJDMDG) for SoC applications;Basak,2019

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