AlN thin films prepared by ion beam induced chemical vapour deposition-Reference-Cited by-同舟云学术

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AlN thin films prepared by ion beam induced chemical vapour deposition

Published:1998-04 Issue:1-2 Volume:317 Page:100-104
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Sánchez-López J.C,Contreras L,Fernández A,González-Elipe A.R,Martin J.M,Vacher B

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Aluminum nitride thin film sensor for force, acceleration, and acoustic emission sensing

2. Electro‐optical effect in aluminum nitride waveguides

3. Thermal Conversion of Preceramic Polyiminoalane Precursors to Aluminum Nitride: Characterization of Pyrolysis Products

4. Summary Abstract: Preparation and optical properties of reactively evaporated VO2 thin films

5. Properties of aluminum nitride films by an ion beam and vapor deposition method

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-energy N+ ion beam induced chemical vapor deposition using tetraethyl orthosilicate, hexamethyldisiloxane, or hexamethyldigermane;AIP Advances;2024-09-01

2. AlN/GaN and InAlN/GaN DBRs;Advances in Imaging and Electron Physics;2019

3. Thermal stability of AlN films prepared by ion beam assisted deposition;Applied Surface Science;2015-08

4. Structural ordering, morphology and optical properties of amorphous Al In1−N thin films grown by plasma-assisted dual source reactive evaporation;Journal of Alloys and Compounds;2015-05

5. Characterization of AlN Thin Films Grown by Pulsed Laser Deposition on Sapphire Substrate;Journal of the Korean Ceramic Society;2013-11-30

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