Author:
Adachi John Y,McIntosh Bob C,Badt Dave E
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. M. Tsukamoto, H. Kuroda, Y. Okamoto, Symposium on VLSI Technology Digest of Technical Papers, IEEE Cat. No. 97CH36114, Kyoto, 1997, p. 23.
2. Asanga Perera et al., Symposium on VLSI Technology Digest of Technical Papers, IEEE Cat. No. 97CH36114, Kyoto, 1997, p. 29.
3. A critical comparison of silicide film deposition techniques
4. Fluorine distributions in a chemical vapor deposited tungsten silicide/polycrystalline silicon composite gate structure
5. Effect of fluorine in chemical‐vapor‐deposited tungsten silicide film on electrical breakdown of SiO2film
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