Dose-dependent dynamics of nanocluster distribution in silicon implanted with Te+ and Pb+ ions: computer simulation and TEM study-Reference-Cited by-同舟云学术

Dose-dependent dynamics of nanocluster distribution in silicon implanted with Te+ and Pb+ ions: computer simulation and TEM study

Published:2002-12 Issue:1-3 Volume:69 Page:455-460
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Bankov P,Kalitzova M,Karpuzov D,Zollo G,Vitali G,Pizzuto C,Angelov Ch,Faure J,Kilian L

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference8 articles.

1. Ryssel H, Ruge J. Ion implantation. Russian ed. Moscow: Nauka, 1983. p. 77.

2. Kalitzova M, Zollo G, Yankov RA, Angelov Ch, Simov S, Vitali G, Pizzuto C, Faure J, Kilian L, Bonhomme P, Manno D, Voelskow M. Jpn J Appl Phys, in press.

3. Tridyn — A TRIM simulation code including dynamic composition changes

4. Ignatova V, Chakarov I. Surface and Coatings Technology 2002; in press.

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