Aluminum nitride thin films prepared by radical-assisted pulsed laser deposition
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference18 articles.
1. The intrinsic thermal conductivity of AIN
2. Disk hydrogen plasma assisted chemical vapor deposition of aluminum nitride
3. Epitaxial growth and piezoelectric properties of A1N, GaN, and GaAs on sapphire or spinel
4. Preparation of aluminum nitride thin films by reactive sputtering and their applications to GHz‐band surface acoustic wave devices
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3. Initial conditions for preparation of thin AlN films by atomic layer deposition;Journal of Physics: Conference Series;2020-04-01
4. Influence of deposition time on the microstructure and dielectric properties of AlN/Si thin films for enhanced hydrogen sensing application;Microelectronic Engineering;2014-01
5. Formation of novel core–shell and tadpole-like structures in the direct nitridation of aluminum powder by N2 and NH3;Journal of Alloys and Compounds;2013-01
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